Plasma Ion
Implantation Group
University of
Saskatchewan
Group
Leader: Prof.
Michael P.
Bradley, Ph.D., P.Eng.
(Physics Room 67 - basement)
Phone:
966-6411 Email: michael.bradley@usask.ca
My research is focused on the application of advanced plasma ion
implantation techniques to the creation of new photonic devices and
structures, with a particular focus on the fabrication of
silicon-compatible photonic materials and devices.
Graduate
Students: Marcel Risch, B.Sc.
Graduate Alumni: Casper J.T. Steenkamp, M.Sc.
Our work
has three inter-related thrusts:
Advanced Plasma Equipment
Development
Physics of Processing Plasmas
Materials for Silicon Compatible
Photonics
Plasma-Related
Publications:
C.J.T. Steenkamp, M.P. Bradley, "Active Charge/Discharge IGBT
Modulator for Marx Generator and Plasma Applications ", IEEE
Transactions
on Plasma Science, 35,
473-478 (2007).
M.P.
Bradley, C.J.T.
Steenkamp, "Time-Resolved Ion and Electron Current Measurements in
Pulsed
Plasma Sheaths", IEEE Transactions on Plasma Science, 34,
1156-1159
(2006).
Q.
Yang, W. Chen, C. Xiao, A. Hirose, M. Bradley
"Low temperature synthesis of diamond thin films through graphite
etching
in a microwave hydrogen plasma" Carbon 43, pp. 2635-2638
(2005)
S. Qin, M.P. Bradley, P.L. Kellerman,
“Faraday
Dosimetry Characteristics of PIII Doping Processes”, IEEE Transactions
on
Plasma Science 31, pp. 369-376
(2003).
S.
Qin, M.P. Bradley, P.L. Kellerman, K. Saadatmand,
"Measurements of secondary electron emission and plasma density
enhancement for plasma exposed surfaces using an optically isolated
Faraday
cup", Rev. Sci. Inst. 73, pp.
1153-1156 (2002).
P.L.
Kellerman, V. Benveniste, M.P. Bradley, K.
Saadatmand, "Particle trapping and annihilation within the extraction
system of ion sources", Rev. Sci. Inst. 73, pp.
834-836 (2002).
P.L.
Kellerman, S. Qin, M.P. Bradley, K. Saadatmand,
"Ion depletion effects in sheath dynamics during plasma immersion ion
implantation- models and data", Rev. Sci. Inst. 73,
pp. 837-839 (2002).
S.
Qin, M.P. Bradley, P.L. Kellerman, K. Saadatmand,
"Measurement and analysis of deposition-etch characteristics of BF3
plasma immersion ion implantation", Rev. Sci. Inst. 73,
pp. 840-842 (2002).
P.L.
Kellerman, M.P. Bradley, and S. Qin,
"Active Charge Control in PIII- enlarging the process space", Surface
and Coatings Technology 156, pp.
77-82 (2002).
J.D.
Bernstein, P.L. Kellerman, and M.P.
Bradley, "Effects of Dopant
Deposition on p+/n and n+/p Shallow Junctions formed by Plasma
Immersion Ion
Implantation", Proceedings of International Conference on Ion
Implantation
Technology 2000 pp. 464-467 (2000).
P.L.
Kellerman, J.D. Bernstein, and M.P. Bradley,
"Ion Energy Distributions in Plasma Immersion Ion Implantation- Theory
and
Experiment", Proceedings of International Conference on Ion
Implantation
Technology 2000 pp. 484-487 (2000).